HIGHLY SENSITIVE NOVOLAK-BASED X-RAY POSITIVE RESIST

[1] BUHR G, Patent No. 2610842

[2] BUHR G, 1978, Patent No. 2718259

[3] CHLEBEK J, 1988, IN PRESS MICROCIRCUI, V7

[4] DEVELOPMENTS IN THE DESIGN AND APPLICATIONS OF NOVEL THERMAL AND PHOTOCHEMICAL INITIATORS FOR CATIONIC POLYMERIZATION [J]. MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1988, 13-4 : 145 - 160

[5] PHOTOCATALYTIC NOVOLAK-BASED POSITIVE RESIST FOR X-RAY LITHOGRAPHY - KINETICS AND SIMULATION. [J]. Microelectronic Engineering, 1987, 6 (1-4) : 503 - 509

[6] FRECHET JMJ, 1986, J IMAGING SCI, V30, P59

[7] Gozdz A. S., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P2, DOI 10.1117/12.963618

[8] ITO H, 1984, ACS SYM SER, V242, P11

[9] CHEMICAL AMPLIFICATION IN THE DESIGN OF DRY DEVELOPING RESIST MATERIALS [J]. POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) : 1012 - 1018

[10] ITO H, 1988, IN PRESS 32ND INT S

[1] BUHR G, Patent No. 2610842

[2] BUHR G, 1978, Patent No. 2718259

[3] CHLEBEK J, 1988, IN PRESS MICROCIRCUI, V7

[4] DEVELOPMENTS IN THE DESIGN AND APPLICATIONS OF NOVEL THERMAL AND PHOTOCHEMICAL INITIATORS FOR CATIONIC POLYMERIZATION [J]. MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1988, 13-4 : 145 - 160

[5] PHOTOCATALYTIC NOVOLAK-BASED POSITIVE RESIST FOR X-RAY LITHOGRAPHY - KINETICS AND SIMULATION. [J]. Microelectronic Engineering, 1987, 6 (1-4) : 503 - 509

[6] FRECHET JMJ, 1986, J IMAGING SCI, V30, P59

[7] Gozdz A. S., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P2, DOI 10.1117/12.963618

[8] ITO H, 1984, ACS SYM SER, V242, P11

[9] CHEMICAL AMPLIFICATION IN THE DESIGN OF DRY DEVELOPING RESIST MATERIALS [J]. POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) : 1012 - 1018

[10] ITO H, 1988, IN PRESS 32ND INT S