NEW-GENERATION OF OXIDE TARGET FOR THE DEPOSITION OF FERROELECTRIC THIN-FILMS BY SPUTTERING

被引：9

作者：

DESCAMPS, M

REMIENS, D

CHABAL, L

JABER, B

THIERRY, B

机构：

[1] Laboratoire des Materiaux Avances Ceramiques - CRITT Ceramiques Fines Techniques, Université de Valenciennes et du Hainaut-Cambrésis, Z. I. Champ de l'Abbesse

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 06期

关键词：

D O I：

10.1063/1.114099

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

PbTiO3 thin films have been prepared on Si/SiO2 substrates by radio frequency planar magnetron sputtering technique. The target used in this experiment consists of multilayers of PbO and TiO2 obtained by tape casting and cold pressing. The composition of the film is easily controlled by the thicknesses of the PbO and TiO2 layers and also by the surface erosion. Target design and preparation, growth parameters and annealing conditions have been optimized to obtain stoichiometric films in the tetragonal crystal structure without second phase.© 1995 American Institute of Physics.

引用

页码：685 / 687

页数：3

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