SPUTTER-DEPTH PROFILING IN AES - DEPENDENCE OF DEPTH RESOLUTION ON ELECTRON AND ION-BEAM GEOMETRY

被引：3

作者：

DUNCAN, S

SMITH, R

SYKES, DE

WALLS, JM

机构：

来源：

SURFACE AND INTERFACE ANALYSIS | 1983年 / 5卷 / 02期

关键词：

D O I：

10.1002/sia.740050204

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：71 / 76

页数：6

共 18 条

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