DEPTH RESOLUTION FACTOR OF A STATIC GAUSSIAN ION-BEAM

被引：27

作者：

MALHERBE, JB ^{[1
]}

SANZ, JM ^{[1
]}

HOFMANN, S ^{[1
]}

机构：

[1] MAX PLANCK INST MET RES,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 1,FED REP GER

来源：

关键词：

D O I：

10.1002/sia.740030602

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：235 / 239

页数：5

共 13 条

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[8] DEPTH RESOLUTION IN SPUTTER PROFILING
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[9] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION
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[10] DEVELOPMENT OF SURFACE-TOPOGRAPHY DURING DEPTH PROFILING IN AUGER-ELECTRON SPECTROSCOPY
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