DEPTH RESOLUTION IN SPUTTER PROFILING

被引：87

作者：

HOFMANN, S ^{[1
]}

机构：

[1] MAX PLANCK INST MET FORSCH,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 1,FED REP GER

来源：

APPLIED PHYSICS | 1977年 / 13卷 / 02期

关键词：

D O I：

10.1007/BF00882481

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：205 / 207

页数：3

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[10] HOFMANN S, TO BE PUBLISHED