HYDROGEN RELEASE AND RETENTION DYNAMICS OF AMORPHOUS-CARBON LAYERS EXPOSED TO A HYDROGEN HELIUM PLASMA

被引：5

作者：

YOSHIDA, S

SUGAI, H

TOYODA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 06期

关键词：

D O I：

10.1143/JJAP.28.1101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1101 / 1108

页数：8

共 15 条

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[9] HYDROGEN RETENTION AND RELEASE DYNAMICS OF AMORPHOUS-CARBON FILMS EXPOSED TO A HYDROGEN PLASMA [J].

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