DIFFUSION OF NICKEL THROUGH TITANIUM NITRIDE FILMS

被引：19

作者：

NOWAK, WB ^{[1
]}

KEUKELAAR, R ^{[1
]}

WANG, W ^{[1
]}

NYAIESH, AR ^{[1
]}

机构：

[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572900

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2242 / 2245

页数：4

相关论文

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