A BIPOLAR PHOTODETECTOR COMPATIBLE WITH STANDARD CMOS TECHNOLOGY

被引:8
作者
VIDAL, MP [1 ]
BAFLEUR, M [1 ]
BUXO, J [1 ]
SARRABAYROUSE, G [1 ]
机构
[1] UNIV CENT BARCELONA,E-08028 BARCELONA,SPAIN
关键词
D O I
10.1016/0038-1101(91)90225-N
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new CMOS compatible bipolar photodetector is presented. The basic idea is that the bipolar characteristics are optimized independently of the photosensitivity. In order to evaluate the performance of this structure, a silicon test vehicle has been realized. A gain value as high as 120 was obtained using a biased polysilicon field-plate on top of the base surface. The proposed photodetector has shown very satisfactory properties such as a sensitivity of 0.75 electrons per photon, a wide dynamic range and a response time of 4-5-mu-s. The possible application to a wide-range, self-adaptive photometer is discussed.
引用
收藏
页码:809 / 814
页数:6
相关论文
共 11 条
[1]   TRANSMITTANCE OF AIR-SIO2-POLYSILICON-SIO2-SI STRUCTURES [J].
ANAGNOSTOPOULOS, C ;
SADASIV, G .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1975, SC10 (03) :177-179
[2]  
[Anonymous], 1989, ANALOG VLSI NEURAL S
[3]  
BAFLEUR M, 1989, TROBADES CIENTIFIQUE
[4]  
CORREIG X, 1988, THESIS UPC BARCELONA
[5]  
Grove A S, 1967, PHYS TECHNOLOGY SEMI
[6]   OPTICAL CHARACTERISTICS OF CMOS-FABRICATED MOSFETS [J].
KIRKISH, SD ;
DALY, JC ;
JOU, L ;
SU, SF .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1987, 22 (02) :299-301
[7]   MOS AREA SENSOR .1. DESIGN CONSIDERATION AND PERFORMANCE OF AN N-P-N STRUCTURE 484X384 ELEMENT COLOR MOS IMAGER [J].
KOIKE, N ;
TAKEMOTO, I ;
SATOH, K ;
HANAMURA, S ;
NAGAHARA, S ;
KUBO, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) :1676-1681
[8]  
LEE MH, 1982, SENSOR REV
[9]  
SZE SM, 1969, PHYSICS SEMICONDUCTO
[10]   A LOW-NOISE BI-CMOS LINEAR IMAGE SENSOR WITH AUTO-FOCUSING FUNCTION [J].
TANAKA, N ;
OHMI, T ;
NAKAMURA, Y ;
MATSUMOTO, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (01) :39-45