MEASURED RADIATION EFFECTS IN MOS CAPACITORS WITH A PROPOSED NEW MODEL

被引:4
作者
HOLMSTROM, FE [1 ]
COLLINS, TW [1 ]
CHURCHILL, JN [1 ]
机构
[1] IBM CORP, GEN PROD DIV, SAN JOSE, CA 95193 USA
关键词
D O I
10.1063/1.1655013
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:464 / 466
页数:3
相关论文
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