MICROSTRUCTURE OF CVD-AL2O3

被引：17

作者：

CHATFIELD, C

LINDSTROM, JN

SJOSTRAND, ME

机构：

来源：

JOURNAL DE PHYSIQUE | 1989年 / 50卷 / C-5期

关键词：

D O I：

10.1051/jphyscol:1989545

中图分类号：

学科分类号：

摘要：

引用

页码：377 / 387

页数：11

共 16 条

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[9] THE ADHESION BETWEEN PHYSICALLY VAPOR-DEPOSITED OR CHEMICALLY VAPOR-DEPOSITED ALUMINA AND TIC-COATED CEMENTED CARBIDES AS CHARACTERIZED BY AUGER-ELECTRON SPECTROSCOPY AND SCRATCH TESTING [J].

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