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GAINP GROWTH BY CHLORIDE VAPOR-PHASE EPITAXY
被引:10
作者
:
HOSHINO, M
论文数:
0
引用数:
0
h-index:
0
HOSHINO, M
KITAHARA, K
论文数:
0
引用数:
0
h-index:
0
KITAHARA, K
KODAMA, K
论文数:
0
引用数:
0
h-index:
0
KODAMA, K
OZEKI, M
论文数:
0
引用数:
0
h-index:
0
OZEKI, M
机构
:
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1989年
/ 96卷
/ 01期
关键词
:
D O I
:
10.1016/0022-0248(89)90287-X
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:188 / 200
页数:13
相关论文
共 35 条
[31]
INTERFACE PROPERTIES FOR GAAS/INGAALP HETEROJUNCTIONS BY THE CAPACITANCE-VOLTAGE PROFILING TECHNIQUE
WATANABE, MO
论文数:
0
引用数:
0
h-index:
0
WATANABE, MO
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
OHBA, Y
[J].
APPLIED PHYSICS LETTERS,
1987,
50
(14)
: 906
-
908
[32]
BAND DISCONTINUITY FOR GAAS ALGAAS HETEROJUNCTION DETERMINED BY C-V PROFILING TECHNIQUE
WATANABE, MO
论文数:
0
引用数:
0
h-index:
0
WATANABE, MO
YOSHIDA, J
论文数:
0
引用数:
0
h-index:
0
YOSHIDA, J
MASHITA, M
论文数:
0
引用数:
0
h-index:
0
MASHITA, M
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
NAKANISI, T
HOJO, A
论文数:
0
引用数:
0
h-index:
0
HOJO, A
[J].
JOURNAL OF APPLIED PHYSICS,
1985,
57
(12)
: 5340
-
5344
[33]
MEASUREMENTS OF DENSITY OF GAAS
WEISBERG, LR
论文数:
0
引用数:
0
h-index:
0
WEISBERG, LR
BLANC, J
论文数:
0
引用数:
0
h-index:
0
BLANC, J
[J].
JOURNAL OF APPLIED PHYSICS,
1963,
34
(04)
: 1002
-
&
[34]
WU M, 1985, J APPL PHYS, V58, P1573
[35]
TELLURIUM AND ZINC DOPING IN IN0.5GA0.5P GROWN BY LIQUID-PHASE EPITAXY
WU, MC
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
WU, MC
SU, YK
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
SU, YK
CHANG, CY
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHANG, CY
CHENG, KY
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHENG, KY
[J].
JOURNAL OF APPLIED PHYSICS,
1985,
58
(11)
: 4317
-
4321
←
1
2
3
4
→
共 35 条
[31]
INTERFACE PROPERTIES FOR GAAS/INGAALP HETEROJUNCTIONS BY THE CAPACITANCE-VOLTAGE PROFILING TECHNIQUE
WATANABE, MO
论文数:
0
引用数:
0
h-index:
0
WATANABE, MO
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
OHBA, Y
[J].
APPLIED PHYSICS LETTERS,
1987,
50
(14)
: 906
-
908
[32]
BAND DISCONTINUITY FOR GAAS ALGAAS HETEROJUNCTION DETERMINED BY C-V PROFILING TECHNIQUE
WATANABE, MO
论文数:
0
引用数:
0
h-index:
0
WATANABE, MO
YOSHIDA, J
论文数:
0
引用数:
0
h-index:
0
YOSHIDA, J
MASHITA, M
论文数:
0
引用数:
0
h-index:
0
MASHITA, M
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
NAKANISI, T
HOJO, A
论文数:
0
引用数:
0
h-index:
0
HOJO, A
[J].
JOURNAL OF APPLIED PHYSICS,
1985,
57
(12)
: 5340
-
5344
[33]
MEASUREMENTS OF DENSITY OF GAAS
WEISBERG, LR
论文数:
0
引用数:
0
h-index:
0
WEISBERG, LR
BLANC, J
论文数:
0
引用数:
0
h-index:
0
BLANC, J
[J].
JOURNAL OF APPLIED PHYSICS,
1963,
34
(04)
: 1002
-
&
[34]
WU M, 1985, J APPL PHYS, V58, P1573
[35]
TELLURIUM AND ZINC DOPING IN IN0.5GA0.5P GROWN BY LIQUID-PHASE EPITAXY
WU, MC
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
WU, MC
SU, YK
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
SU, YK
CHANG, CY
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHANG, CY
CHENG, KY
论文数:
0
引用数:
0
h-index:
0
机构:
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHUNG CHENG INST TECHNOL,DEPT ELECT ENGN,TA HSI,TAIWAN
CHENG, KY
[J].
JOURNAL OF APPLIED PHYSICS,
1985,
58
(11)
: 4317
-
4321
←
1
2
3
4
→