THE KINETICS OF SILICON DIOXIDE CHEMICAL VAPOR-DEPOSITION .1. SURFACE CHEMICAL-REACTIONS

被引：8

作者：

GRABIEC, PB ^{[1
]}

PRZYLUSKI, J ^{[1
]}

机构：

[1] WARSAW TECH UNIV,INST GEN CHEM & INORGAN TECHNOL,PL-00663 WARSAW,POLAND

来源：

SURFACE TECHNOLOGY | 1985年 / 25卷 / 04期

关键词：

D O I：

10.1016/0376-4583(85)90082-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：307 / 313

页数：7

共 24 条

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