A NITRIC OXIDE PROCESS FOR DEPOSITION OF SILICA FILMS

被引：17

作者：

RAND, MJ

机构：

来源：

关键词：

D O I：

10.1149/1.2426566

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：274 / &

共 9 条

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[7]

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