FABRICATION OF HIGH NUMERICAL APERTURE ZONE PLATES USING DEEP ULTRAVIOLET LITHOGRAPHY

被引：6

作者：

KODATE, K ^{[1
]}

TAKENAKA, H ^{[1
]}

KAMIYA, T ^{[1
]}

机构：

[1] UNIV TOKYO,DEPT ELECTR ENGN,BUNKYO KU,TOKYO 113,JAPAN

来源：

APPLIED OPTICS | 1984年 / 23卷 / 03期

关键词：

D O I：

10.1364/AO.23.000504

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：504 / 507

页数：4

共 10 条

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KAMIYA, T
[J]. OPTICAL AND QUANTUM ELECTRONICS, 1982, 14 (01) : 85 - 88
[7] KODATE K, UNPUB JPN J APPL PHY
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OOKI, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 199 - 204
[9] X-RAY ZONE PLATES FABRICATED USING ELECTRON-BEAM AND X-RAY-LITHOGRAPHY
SHAVER, DC
FLANDERS, DC
CEGLIO, NM
SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1626 - 1630
[10] GRADED-INDEX FRESNEL LENSES FOR INTEGRATED-OPTICS
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[J]. APPLIED OPTICS, 1982, 21 (11): : 1966 - 1971