IDENTIFICATION OF THE SI(001) MISSING DIMER DEFECT STRUCTURE BY LOW-BIAS VOLTAGE STM AND LDA MODELING

被引:46
作者
OWEN, JHG
BOWLER, DR
GORINGE, CM
MIKI, K
BRIGGS, GAD
机构
[1] Department of Materials, Oxford University, Oxford
基金
英国工程与自然科学研究理事会;
关键词
DENSITY FUNCTIONAL CALCULATIONS; LOW INDEX SINGLE CRYSTAL SURFACES; SCANNING TUNNELING MICROSCOPY; SEMIEMPIRICAL MODELS AND MODEL CALCULATIONS; SILICON; SURFACE DEFECTS; SURFACE ELECTRONIC PHENOMENA; SURFACE STRUCTURE; MORPHOLOGY;
D O I
10.1016/0039-6028(95)00794-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A JEOL scanning tunneling microscope (STM) has been used to image the clean silicon (001) surface at low sample bias voltages (around -0.4 V). At this bias, many dimer vacancies are highlighted by a bright feature on the neighbouring dimers. On other defects, this situation is reversed; the area around the defect becomes dark at low voltages. In both cases, at higher bias voltages (around -0.8 V), this contrast disappears. For a number of proposed structures of the single dimer vacancy, ab initio calculations of charge density as a function of energy have been used to simulate STM images. These images show significant bias voltage dependence, and the low bias voltage images differ markedly between the structures modelled. On this basis, we identify the rebonded structure with the bright defect, and the non-rebonded structure with the dark defect.
引用
收藏
页码:L1042 / L1047
页数:6
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