MASS-FLOW LIMITATIONS IN REACTIVE SPUTTERING

[1] INVESTIGATION OF TIN FILMS REACTIVELY SPUTTERED USING A SPUTTER GUN [J]. THIN SOLID FILMS, 1983, 107 (01) : 45 - 54

[2] BLOM HO, 1984, UNPUB THIN SOLID FIL

[3] THE ANALYSIS AND AUTOMATIC-CONTROL OF A REACTIVE DC MAGNETRON SPUTTERING PROCESS [J]. THIN SOLID FILMS, 1983, 108 (01) : 1 - 7

[4] KARLSSON B, 1982, SPIE J, V324

[5] ZRN DIFFUSION BARRIER IN ALUMINUM METALLIZATION SCHEMES [J]. THIN SOLID FILMS, 1983, 104 (1-2) : 81 - 87

[6] DIFFUSION BARRIERS IN THIN-FILMS [J]. THIN SOLID FILMS, 1978, 52 (03) : 415 - 443

[7] REACTIVELY SPUTTERED ZRN USED AS AN AL/SI DIFFUSION BARRIER IN A ZR CONTACT TO SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 281 - 283

[8] MECHANISM OF RF REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) : 3381 - 3384

[1] INVESTIGATION OF TIN FILMS REACTIVELY SPUTTERED USING A SPUTTER GUN [J]. THIN SOLID FILMS, 1983, 107 (01) : 45 - 54

[2] BLOM HO, 1984, UNPUB THIN SOLID FIL

[3] THE ANALYSIS AND AUTOMATIC-CONTROL OF A REACTIVE DC MAGNETRON SPUTTERING PROCESS [J]. THIN SOLID FILMS, 1983, 108 (01) : 1 - 7

[4] KARLSSON B, 1982, SPIE J, V324

[5] ZRN DIFFUSION BARRIER IN ALUMINUM METALLIZATION SCHEMES [J]. THIN SOLID FILMS, 1983, 104 (1-2) : 81 - 87

[6] DIFFUSION BARRIERS IN THIN-FILMS [J]. THIN SOLID FILMS, 1978, 52 (03) : 415 - 443

[7] REACTIVELY SPUTTERED ZRN USED AS AN AL/SI DIFFUSION BARRIER IN A ZR CONTACT TO SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 281 - 283

[8] MECHANISM OF RF REACTIVE SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) : 3381 - 3384