THE ANALYSIS AND AUTOMATIC-CONTROL OF A REACTIVE DC MAGNETRON SPUTTERING PROCESS

被引：27

作者：

ENJOUJI, K

MURATA, K

NISHIKAWA, S

机构：

来源：

THIN SOLID FILMS | 1983年 / 108卷 / 01期

关键词：

D O I：

10.1016/0040-6090(83)90035-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：1 / 7

页数：7

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