BEHAVIOR OF ALUMINUM NITRIDE CERAMIC SURFACES UNDER HYDROTHERMAL OXIDATION TREATMENTS

被引:9
作者
SURYANARAYANA, D
MATIENZO, LJ
SPENCER, DF
机构
来源
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1989年 / 12卷 / 04期
关键词
D O I
10.1109/33.49017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:566 / 570
页数:5
相关论文
共 20 条
[1]   THE THERMAL-STABILITY OF AIN [J].
ABID, A ;
BENSALEM, R ;
SEALY, BJ .
JOURNAL OF MATERIALS SCIENCE, 1986, 21 (04) :1301-1304
[2]  
BILLY M, 1982, REV CHIM MINER, V19, P673
[3]  
BILLY M, 1983, PROGR NITROGEN CERAM
[4]  
CHANCHANI R, 1988, IEEE T COMPON HYBR, V11, P427, DOI 10.1109/33.16678
[5]  
IWASI N, 1984, INT J HYBRID MICROEL, V7, P49
[6]  
IWASI N, 1986, SOLID STATE TECH OCT, P135
[7]   KINETICS AND INITIAL-STAGES OF OXIDATION OF ALUMINUM NITRIDE - THERMOGRAVIMETRIC ANALYSIS AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY [J].
KATNANI, AD ;
PAPATHOMAS, KI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1335-1340
[8]  
KLUGEWEISS P, 1985, MATER RES SOC S P, V40, P399
[9]  
KOMEYA K, 1984, CERAMIC B, V63, P1158
[10]   AUGER-ELECTRON AND X-RAY PHOTOELECTRON-SPECTROSCOPY OF SPUTTER DEPOSITED ALUMINUM NITRIDE [J].
KOVACICH, JA ;
KASPERKIEWICZ, J ;
LICHTMAN, D ;
AITA, CR .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (08) :2935-2939