OVERLAY MEASUREMENTS FOR X-RAY-LITHOGRAPHY

被引:2
作者
MULLER, KH
BURGHAUSE, H
机构
[1] TECH UNIV BERLIN,INST FESTKORPERPHYS,D-1000 BERLIN 12,FED REP GER
[2] FRAUNHOFER INST MIKROSTRUKT TECH,D-1000 BERLIN 33,FED REP GER
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词
D O I
10.1116/1.583236
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:241 / 244
页数:4
相关论文
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    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1262 - 1266
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