MAGNETIC-FIELD AND SUBSTRATE POSITION EFFECTS ON THE ION DEPOSITION FLUX RATIO IN MAGNETRON SPUTTERING

The dependence of the charged particle flux on the magnetics for magnetron sputtering sources have been systematically studied. Magnetic field line plots were obtained for various magnetic configurations. The magnetrons were increasingly unbalanced as the strength of the center magnet was reduced and the strength of the annular magnet increased. A magnetic bottle along the magnetron axis developed as the magnetron became more unbalanced. This bottle strongly influenced the ion current density. The ion/deposition flux ratio increased with decreasing target-to-substrate distance.