INFLUENCE OF IMPLANTED XENON ON SPUTTERING YIELD OF SILICON

[21] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[22] Weissmann R., 1973, Radiation Effects, V19, P69, DOI 10.1080/00337577308232221

[23] WHAN RE, 1970, APPL PHYS LETT, V17, P379

[21] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[22] Weissmann R., 1973, Radiation Effects, V19, P69, DOI 10.1080/00337577308232221

[23] WHAN RE, 1970, APPL PHYS LETT, V17, P379