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ANALYSIS OF POLYCRYSTALLINE SILICON DIFFUSION SOURCES BY SECONDARY ION MASS-SPECTROMETRY
被引:55
作者
:
SCHABER, H
论文数:
0
引用数:
0
h-index:
0
SCHABER, H
VONCRIEGERN, R
论文数:
0
引用数:
0
h-index:
0
VONCRIEGERN, R
WEITZEL, I
论文数:
0
引用数:
0
h-index:
0
WEITZEL, I
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1985年
/ 58卷
/ 11期
关键词
:
D O I
:
10.1063/1.335582
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:4036 / 4042
页数:7
相关论文
共 23 条
[21]
ARSENIC IMPLANTATION INTO POLYCRYSTALLINE SILICON AND DIFFUSION TO SILICON SUBSTRATE
TSUKAMOTO, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
TSUKAMOTO, K
AKASAKA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
AKASAKA, Y
HORIE, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
HORIE, K
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(05)
: 1815
-
1821
[22]
WERNER HW, 1979, MIKROCHIM ACTA S, V8, P25
[23]
THE POLY-SINGLE CRYSTALLINE SILICON INTERFACE
WONG, CY
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
WONG, CY
MICHEL, AE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
MICHEL, AE
ISAAC, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
ISAAC, RD
KASTL, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
KASTL, RH
MADER, SR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
MADER, SR
[J].
JOURNAL OF APPLIED PHYSICS,
1984,
55
(04)
: 1131
-
1134
←
1
2
3
→
共 23 条
[21]
ARSENIC IMPLANTATION INTO POLYCRYSTALLINE SILICON AND DIFFUSION TO SILICON SUBSTRATE
TSUKAMOTO, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
TSUKAMOTO, K
AKASAKA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
AKASAKA, Y
HORIE, K
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
MITSUBISHI ELECTR CORP,LSI DEV LAB,AMAGASAKI,HYOGO 661,JAPAN
HORIE, K
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(05)
: 1815
-
1821
[22]
WERNER HW, 1979, MIKROCHIM ACTA S, V8, P25
[23]
THE POLY-SINGLE CRYSTALLINE SILICON INTERFACE
WONG, CY
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
WONG, CY
MICHEL, AE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
MICHEL, AE
ISAAC, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
ISAAC, RD
KASTL, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
KASTL, RH
MADER, SR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
MADER, SR
[J].
JOURNAL OF APPLIED PHYSICS,
1984,
55
(04)
: 1131
-
1134
←
1
2
3
→