ORIGIN OF LAMELLAE IN RADIATIVELY MELTED SILICON FILMS

被引：62

作者：

HAWKINS, WG ^{[1
]}

BIEGELSEN, DK ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

关键词：

D O I：

10.1063/1.93939

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：358 / 360

页数：3

共 11 条

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