INTERPRETATION OF DISLOCATION CONTRAST IN X-RAY TOPOGRAPHS OF GAAS1-XPX

被引：37

作者：

MADER, S ^{[1
]}

BLAKESLEE, AE ^{[1
]}

ANGILELLO, J ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 11期

关键词：

D O I：

10.1063/1.1663126

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4730 / 4734

页数：5

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