POLYCRYSTALLINE SILICON AS A STRAIN-GAUGE MATERIAL

被引:27
作者
FRENCH, PJ
EVANS, AGR
机构
[1] Department of Electronics and Information Engineering, University of Southampton, Southampton SO9 5NH, United Kingdom
来源
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1986年 / 19卷 / 12期
关键词
SILICON AND ALLOYS - Applications;
D O I
10.1088/0022-3735/19/12/016
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is described. This model considers the contribution to piezoresistance from the grain and the Schottky-type barrier regions around the grain boundaries. Transport across the grain boundaries. Transport across the grain boundary is assumed to be dominated by thermionic emission. The change in conductivity is due to a shift in the relevant conduction and valence band minima and maxima relative to each other, resulting in a redistribution of the carriers between minima or bands. This shift will result in a change in contribution to thermionic emission from the minima or bands and thus change the conductivity of the barrier.
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收藏
页码:1055 / 1058
页数:4
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