CONCENTRATION DEPTH PROFILES BY XPS - A NEW APPROACH

被引:73
作者
TOUGAARD, S [1 ]
IGNATIEV, A [1 ]
机构
[1] UNIV HOUSTON,DEPT PHYS,HOUSTON,TX 77004
关键词
D O I
10.1016/0039-6028(83)90186-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:355 / 365
页数:11
相关论文
共 17 条
[1]   DEPTH RESOLUTION OF SPUTTER PROFILING [J].
ANDERSEN, HH .
APPLIED PHYSICS, 1979, 18 (02) :131-140
[2]  
ANDERSEN HH, 1981, TOP APPL PHYS, V47, P145, DOI [10.1007/3540105212_9, DOI 10.1007/3540105212_9]
[4]  
FADLEY CS, 1978, ELECTRON SPECTROSCOP, V2
[5]  
Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406
[6]  
MADDEN HH, 1976, J APPL PHYS, V47, P307
[7]  
Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103
[8]  
Seah M. P., 1980, Surface and Interface Analysis, V2, P222, DOI 10.1002/sia.740020607
[9]   HIGH-RESOLUTION X-RAY PHOTOEMISSION SPECTRUM OF VALENCE BANDS OF GOLD [J].
SHIRLEY, DA .
PHYSICAL REVIEW B, 1972, 5 (12) :4709-&
[10]   LINEARIZED SECONDARY-ELECTRON CASCADES FROM SURFACES OF METALS .2. SURFACE AND SUBSURFACE SOURCES [J].
SICKAFUS, EN .
PHYSICAL REVIEW B, 1977, 16 (04) :1448-1458