MAGNETIC AND STRUCTURAL-PROPERTIES OF DUAL ION-BEAM SPUTTERED PURE IRON FILMS

被引:15
作者
ISHIWATA, N
WAKABAYASHI, C
MATSUMOTO, T
机构
关键词
D O I
10.1109/TMAG.1987.1065285
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2152 / 2154
页数:3
相关论文
共 4 条
[1]  
CHIKAZUMI S, PHYSICS FERROMAGNETI, V2
[2]   TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING [J].
KAUFMAN, HR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :272-276
[3]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J].
KAUFMAN, HR ;
CUOMO, JJ ;
HARPER, JME .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :725-736
[4]   DEPOSITION OF RUST PROOF IRON THIN-FILMS WITH SOFT MAGNETIC-PROPERTIES BY DUAL ION-BEAM SPUTTERING [J].
NAOE, M ;
YAMAGA, M ;
TERADA, N .
IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (05) :1900-1902