ELECTROCHEMICAL AND PHOTOELECTROCHEMICAL BEHAVIOR OF N-GAAS AND P-GAAS IN THE PRESENCE OF H2O2

被引:19
作者
BADAWY, WA [1 ]
PFUHL, G [1 ]
PLIETH, WJ [1 ]
机构
[1] FREE UNIV BERLIN, INST PHYS CHEM, W-1000 BERLIN 33, GERMANY
关键词
D O I
10.1149/1.2086493
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrochemical and photoelectrochemical behavior of surfaces of (100) n-GaAs and p-GaAs were studied in acid and alkaline solutions containing H2O2. Hydrogen peroxide shifted the flatband potential of p-GaAs, while it did not affect that of n-GaAs. The direction of the shift depended on the pH of the electrolyte: cathodically in acid and anodically in alkaline solution. The reduction of H2O2 in the dark and under illumination was studied by dark current and by photocurrent potential measurements. A mechanism for the decomposition of GaAs at the electrode/electrolyte interface was formulated. © 1990, The Electrochemical Society, Inc. All rights reserved.
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页码:531 / 537
页数:7
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