AN ULTRAHIGH-VACUUM COMPATIBLE FLUORINE ATOM SOURCE FOR GAS-SURFACE REACTION STUDIES

被引：14

作者：

STINESPRING, CD

FREEDMAN, A

KOLB, CE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 04期

关键词：

D O I：

10.1116/1.573753

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：1946 / 1947

页数：2

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