APPLICATION OF LOOP ANNEALING TECHNIQUE TO SELF-DIFFUSION STUDIES IN SILICON

被引：34

作者：

SANDERS, IR ^{[1
]}

DOBSON, PS ^{[1
]}

机构：

[1] UNIV BIRMINGHAM,DEPT PHYS MET & SCI MAT,BIRMINGHAM,ENGLAND

来源：

关键词：

D O I：

10.1007/BF00540547

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1987 / 1993

页数：7

共 14 条

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