SUB-0.5-MU-M LITHOGRAPHY WITH A NEW ION PROJECTION LITHOGRAPHY MACHINE USING SILICON OPEN STENCIL MASKS

被引：8

作者：

BUCHMANN, LM ^{[1
]}

CSEPREGI, L ^{[1
]}

HEUBERGER, A ^{[1
]}

MULLER, KP ^{[1
]}

CHALUPKA, A ^{[1
]}

HAMMEL, E ^{[1
]}

LOSCHNER, H ^{[1
]}

STENGL, G ^{[1
]}

机构：

[1] ION MICROFABRICAT SYST,A-1020 WIEN,AUSTRIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584116

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2080 / 2084

页数：5

共 15 条

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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 223 - 227
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05): : 1003 - 1007