SUPERHIGH-RATE PLASMA-JET ETCHING OF SILICON

被引：31

作者：

BARDOS, L

BERG, S

BLOM, HO

机构：

来源：

关键词：

D O I：

10.1063/1.102215

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1615 / 1617

页数：3

共 6 条

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DUSEK, V ;

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[2]

BARDOS L, 1987 P INT S PLASM C, P1177

[3]

BARDOS L, 1988, THIN SOLID FILMS, V159, P265

[4] MAGNETRON-PLASMA ION-BEAM ETCHING - A NEW DRY ETCHING TECHNIQUE [J].

CHINN, JD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1379-1383

[5]

EINSPRUCH NG, 1984, VLSI ELECTRONICS MIC, V8

[6] HOLLOW-CATHODE ETCHING AND DEPOSITION [J].

HORWITZ, CM ;

BORONKAY, S ;

GROSS, M ;

DAVIES, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1837-1844