A NEW METHOD (METHOD OF ALPHA-PARAMETERS) FOR CORRECTING PIXE MEASUREMENTS FOR MATRIX EFFECTS IN INFINITELY THICK SAMPLES

被引：11

作者：

ALOUPOGIANNIS, P

WEBER, G

QUISEFIT, JP

DELBROUCK, JM

ROELANDTS, I

ROUELLE, MC

ROBAYE, G

机构：

[1] UNIV PARIS 07,CNRS,UA 717,PHYS CHIM ATMOSPHERE LAB,F-75221 PARIS 05,FRANCE

[2] STATE UNIV LIEGE,INST GEOL,B-4000 LIEGE,BELGIUM

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 42卷 / 03期

关键词：

D O I：

10.1016/0168-583X(89)90447-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：359 / 368

页数：10

共 19 条

[1]

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[3] USE OF RUTHERFORD SCATTERING ON A SECONDARY CARBON TARGET FOR CORRECTING INTERMEDIATE THICKNESS SAMPLE PIXE MEASUREMENTS [J].

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[6]

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[7] THE POTENTIAL OF MEV ION-BEAM TECHNIQUES IN MUSEUM SCIENCE [J].

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[8] EVALUATION OF DEPTH PROFILING WITH PIXE [J].

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 12 (02) :235-244

[9] UNCERTAINTIES IN THICK-TARGET PIXE ANALYSIS [J].

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[10]

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