RATE-CONSTANT AND MECHANISM OF THE SIH3+SIH3 REACTION

被引：22

作者：

KOSHI, M ^{[1
]}

MIYOSHI, A ^{[1
]}

MATSUI, H ^{[1
]}

机构：

[1] NATL INST ENVIRONM STUDIES,DIV ATMOSPHER ENVIRONM,YATABE,IBARAKI 305,JAPAN

来源：

CHEMICAL PHYSICS LETTERS | 1991年 / 184卷 / 5-6期

关键词：

D O I：

10.1016/0009-2614(91)80016-Q

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The kinetics of the SiH3 + SiH3 reaction was studied with time-resolved mass spectrometry. Silyl radicals, as well as Si2H6 and HCl, produced by ArF laser photolysis of CCl4/SiH4/He mixtures were detected by using a near-threshold electron-impact ionization technique. The rate constant of (1.2 +/- 0.4) x 10(-10) cm3 molecule-1 s-1 for the SiH3 + SiH3 reaction at T = 293 K was derived both from the decay rate of SiH3 and the production rate of Si2H6. Steady-state analysis indicated that the fraction of SiH2 formation in the SiH3 + SiH3 reaction was equal to 0.62 +/- 0.14 at p = 5 Torr.

引用

页码：442 / 447

页数：6

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