DIFFUSION-COEFFICIENT AND REACTION-RATE CONSTANT OF THE SIH3 RADICAL IN SILANE PLASMA

被引：78

作者：

ITABASHI, N ^{[1
]}

KATO, K ^{[1
]}

NISHIWAKI, N ^{[1
]}

GOTO, T ^{[1
]}

YAMADA, C ^{[1
]}

HIROTA, E ^{[1
]}

机构：

[1] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 02期

关键词：

D O I：

10.1143/JJAP.28.L325

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L325 / L328

页数：4

相关论文

共 9 条

[1] BROWN SC, 1956, HDB PHYSIK, V22, P533
[2] GORDY W, 1970, MICROWAVE MOL SPECTR, pCH3
[3] HERZBERT G, 1966, MOL SPECTRA MOL STRU, V3, P225
[4] MEASUREMENT OF THE SIH3 RADICAL DENSITY IN SILANE PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY
ITABASHI, N
KATO, K
NISHIWAKI, N
GOTO, T
YAMADA, C
HIROTA, E
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (08): : L1565 - L1567
[5] ABSOLUTE RATE CONSTANTS FOR THE REACTION OF SILYLENE WITH HYDROGEN, SILANE, AND DISILANE
JASINSKI, JM
CHU, JO
[J]. JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (03) : 1678 - 1687
[6] INVESTIGATION OF THE GROWTH-KINETICS OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON USING A RADICAL SEPARATION TECHNIQUE
MATSUDA, A
TANAKA, K
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (07) : 2351 - 2356
[7] MCDANIEL EW, 1964, COLLISION PHENOMENA, P455
[8] PRODUCTION MECHANISM AND REACTIVITY OF THE SIH RADICAL IN A SILANE PLASMA
SCHMITT, JPM
GRESSIER, P
KRISHNAN, M
DEROSNY, G
PERRIN, J
[J]. CHEMICAL PHYSICS, 1984, 84 (02) : 281 - 293
[9] DETECTION OF THE SILYL RADICAL SIH3 BY INFRARED DIODE-LASER SPECTROSCOPY
YAMADA, C
HIROTA, E
[J]. PHYSICAL REVIEW LETTERS, 1986, 56 (09) : 923 - 925