CHARACTERISTICS OF THERMAL SIO2-FILMS DURING NITRIDATION

被引：53

作者：

PAN, PH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 01期

关键词：

D O I：

10.1063/1.338818

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：284 / 293

页数：10

共 40 条

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