CHANNELING AND TEM STUDIES ON SB+ IMPLANTED NI

被引：12

作者：

ALTAMIMI, ZYA

GRANT, WA

CARTER, G

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期

关键词：

ANTIMONY AND ALLOYS - Microscopes; Electron;

D O I：

10.1016/0167-5087(83)90824-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Results are reported of a detailed study of Sb** plus ion implantation of single crystal and polycrystalline nickel. Rutherford backscattering and channelling together with transmission electron microscopy and transmission and reflection electron diffraction have been employed to measure the type and level of radiation damage, atom location and thermal annealing of damage for Sb** plus implantation. The susceptibility of Ni to heavy ion damage has further been examined using molecular Sb//2** plus implantations.

引用

页码：363 / 369

页数：7