INVESTIGATION OF THE ELECTRONIC-STRUCTURES AND ASSOCIATED PROPERTIES INCLUDING HYPERFINE INTERACTIONS FOR HALOGEN-ADSORBED SILICON SURFACES - FLUORINE THROUGH IODINE

被引：30

作者：

MOHAPATRA, SM

DEV, BN

MISHRA, KC

SAHOO, N

GIBSON, WM

DAS, TP

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 17期

关键词：

D O I：

10.1103/PhysRevB.38.12556

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：12556 / 12566

页数：11

共 72 条

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