CONTACT REACTION OF SILICON AND THIN-FILMS OF IR-V ALLOYS

被引：8

作者：

EIZENBERG, M ^{[1
]}

BRENER, R ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,IL-32000 HAIFA,ISRAEL

来源：

THIN SOLID FILMS | 1982年 / 89卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90308-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：355 / 359

页数：5

相关论文

共 8 条

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[6] FORMATION OF IRIDIUM SILICIDES FROM IR THIN-FILMS ON SI SUBSTRATES
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[7] SHALLOW SILICIDE CONTACT
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[8] FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS
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