THE ROLE OF ENERGETIC ION-BOMBARDMENT IN SILICON-FLUORINE CHEMISTRY

[1] BURTON RH, 1984, MATERIALS PROCESSING, V4, P79

[2] CHOW TP, 1984, MATERIALS PROCESSING, V4, P39

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] PLASMA-ASSISTED ETCHING - ION-ASSISTED SURFACE-CHEMISTRY [J]. APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY): : 63 - 71

[5] DIELEMAN J, 1984, SOLID STATE TECHNOL, V27, P191

[6] DONNELLY VM, 1981, SOLID STATE TECHNOL, V24, P161

[7] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[8] FLAMM DL, 1984, VLSI ELECTRONICS MIC, V8, P189

[9] PLASMA OXIDATION [J]. THIN SOLID FILMS, 1982, 95 (04) : 297 - 308

[10] ION-BEAM ASSISTED DEPOSITION OF METAL ORGANIC FILMS USING FOCUSED ION-BEAMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05): : L293 - L295

[1] BURTON RH, 1984, MATERIALS PROCESSING, V4, P79

[2] CHOW TP, 1984, MATERIALS PROCESSING, V4, P39

[3] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403

[4] PLASMA-ASSISTED ETCHING - ION-ASSISTED SURFACE-CHEMISTRY [J]. APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY): : 63 - 71

[5] DIELEMAN J, 1984, SOLID STATE TECHNOL, V27, P191

[6] DONNELLY VM, 1981, SOLID STATE TECHNOL, V24, P161

[7] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[8] FLAMM DL, 1984, VLSI ELECTRONICS MIC, V8, P189

[9] PLASMA OXIDATION [J]. THIN SOLID FILMS, 1982, 95 (04) : 297 - 308

[10] ION-BEAM ASSISTED DEPOSITION OF METAL ORGANIC FILMS USING FOCUSED ION-BEAMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05): : L293 - L295