HIGH-ENERGY X-RAY ANOMALOUS DISPERSION CORRECTION FOR SILICON

被引：21

作者：

DEUTSCH, M ^{[1
]}

HART, M ^{[1
]}

机构：

[1] UNIV MANCHESTER,SCHUSTER LAB,MANCHESTER M13 9PL,LANCS,ENGLAND

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.37.2701

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2701 / 2703

页数：3

共 22 条

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