共 14 条
[1]
BELEVSKII VP, 1970, PRIB TEKH EKSPER, V6, P203
[2]
EINSPRUCH NG, 1981, VLSI ELECTRONICS
[4]
GRANT WA, 1976, SCI PROG, V63, P27
[5]
DIFFUSION-THEORY FOR CONTINUOUS METAL AMORPHOUS-SEMICONDUCTOR CONTACTS
[J].
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,
1982, 74 (02)
:497-509
[6]
HOLM R, 1967, ELECTRICAL CONTACTS
[7]
RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON
[J].
BELL SYSTEM TECHNICAL JOURNAL,
1962, 41 (02)
:387-+
[8]
MODEL CALCULATIONS OF PROFILES AND DOSE OF HIGH DOSE ION IMPLANTS INFLUENCED BY SPUTTERING
[J].
NUCLEAR INSTRUMENTS & METHODS,
1976, 134 (01)
:167-172
[9]
KRAUTLE H, 1973, ION IMPLANTATION SEM, P585
[10]
ION-BEAM CONTACTING OF P-TYPE GAP
[J].
ACTA PHYSICA ACADEMIAE SCIENTIARUM HUNGARICAE,
1981, 51 (04)
:371-377