NORMAL-INCIDENCE X-RAY MIRROR FOR 7-NM

被引：38

作者：

STEARNS, DG ^{[1
]}

ROSEN, RS ^{[1
]}

VERNON, SP ^{[1
]}

机构：

[1] VERNON APPL PHYS,TORRANCE,CA 90505

来源：

OPTICS LETTERS | 1991年 / 16卷 / 16期

关键词：

D O I：

10.1364/OL.16.001283

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Multilayer (ML) structures composed of alternating, ultrathin layers of Ru and B4C have been grown by dc magnetron sputtering. The ML microstructure has been characterized using x-ray diffraction and high-resolution transmission electron microscopy, and the normal-incidence reflectivity has been measured using synchrotron radiation. It is found that, under optimum deposition conditions, the ML structures exhibit smooth and compositionally abrupt interfaces, with a normal-incidence reflectivity as high as 20% at 7.2 nm. The reflectivity decreases when the ML structures are annealed at 500-degrees-C owing to interdiffusion and compound formation at the interfaces.

引用

页码：1283 / 1285

页数：3

共 10 条

[1] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M [J].