MICROSTRUCTURES AND HYDROGEN-BONDING ENVIRONMENTS OF SPUTTER-DEPOSITED A-SI-H FILMS

被引：8

作者：

NODA, M

ISHIDA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 04期

关键词：

D O I：

10.1143/JJAP.21.L195

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L195 / L197

页数：3

共 8 条

[1]

BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[2] INFRARED VIBRATIONAL-SPECTRA OF RF-SPUTTERED HYDROGENATED AMORPHOUS SILICON [J].

FREEMAN, EC ;

PAUL, W .

PHYSICAL REVIEW B, 1978, 18 (08) :4288-4300

[3] HYDROGEN ELIMINATION DURING THE GLOW-DISCHARGE DEPOSITION OF A-SI-H ALLOYS [J].

KAMPAS, FJ ;

GRIFFITH, RW .

APPLIED PHYSICS LETTERS, 1981, 39 (05) :407-409

[4] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS [J].

KNIGHTS, JC ;

LUJAN, RA .

APPLIED PHYSICS LETTERS, 1979, 35 (03) :244-246

[5] EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS [J].

KNIGHTS, JC ;

LUJAN, RA ;

ROSENBLUM, MP ;

STREET, RA ;

BIEGLESEN, DK ;

REIMER, JA .

APPLIED PHYSICS LETTERS, 1981, 38 (05) :331-333

[6] STRUCTURAL INTERPRETATION OF THE VIBRATIONAL-SPECTRA OF A-SI-H ALLOYS [J].

LUCOVSKY, G ;

NEMANICH, RJ ;

KNIGHTS, JC .

PHYSICAL REVIEW B, 1979, 19 (04) :2064-2073

[7]

Nemanich R. J., 1980, Journal of the Physical Society of Japan, V49, P1189

[8] DISSENT FROM THE DIHYDRIDE MODEL OF THE VIBRATIONAL-SPECTRA OF AMORPHOUS SILICON-HYDROGEN ALLOYS [J].

PAUL, W .

SOLID STATE COMMUNICATIONS, 1980, 34 (05) :283-285

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