DEPOSITION AND PIEZOELECTRIC CHARACTERISTICS OF ZNO FILMS BY USING AN ECR SPUTTERING SYSTEM

被引：10

作者：

KADOTA, M ^{[1
]}

KASANAMI, T ^{[1
]}

MINAKATA, M ^{[1
]}

机构：

[1] TOHOKU UNIV,SENDAI,MIYAGI 980,JAPAN

来源：

IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL | 1994年 / 41卷 / 04期

关键词：

D O I：

10.1109/58.294108

中图分类号：

O42 [声学];

学科分类号：

070206 ; 082403 ;

摘要：

Piezoelectric properties of ZnO films, were investigated by using an Electron Cyclotron Resonance (ECR) sputtering system. It was confirmed that this system was capable of depositing a ZnO film with a large specific resistance, and good c-axis orientation on an interdigital transducer (IDT)/glass substrate at a low temperature (less than 200-degrees-C) and in a low gas pressure (approximately 10(-4) torr). Furthermore these ZnO films exhibited excellent SAW characteristics (insertion losses) and effective electromechanical coupling factors (k(eff)) compared with ZnO films deposited by a conventional RF magnetron sputtering system. Further, this ECR sputtering system was capable of depositing a ZnO film, without heating the substrate, that was capable of propagating a Rayleigh SAW at 700 MHz for the first time.

引用

页码：479 / 483

页数：5

共 13 条

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