FORMATION AND QUENCHING OF XEF AND KRF ELECTRONIC EXCITED-STATES

被引：12

作者：

EDEN, JG ^{[1
]}

SEARLES, SK ^{[1
]}

机构：

[1] USN,RES LAB,DIV OPTICAL SCI,LASER PHYS BRANCH,WASHINGTON,DC 20375

来源：

APPLIED PHYSICS LETTERS | 1976年 / 29卷 / 06期

关键词：

D O I：

10.1063/1.89077

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：356 / 358

页数：3

共 9 条

[1]

BERGER MJ, 1964, SP3012 NASA REP

[2] HIGH-EFFICIENCY KRF EXCIMER LASER [J].

BHAUMIK, ML ;

BRADFORD, RS ;

AULT, ER .

APPLIED PHYSICS LETTERS, 1976, 28 (01) :23-24

[3] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

[4]

Gordon M., 1975, EXCIPLEX

[5] KINETIC-MODEL OF XEBR RARE-GAS MONOHALIDE EXCIMER LASER [J].

HART, GA ;

SEARLES, SK .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) :2033-2036

[6] SUSTAINER ENHANCEMENT OF VUV FLUORESCENCE IN HIGH-PRESSURE XENON [J].

HUBER, EE ;

JONES, LR ;

GEORGE, EV ;

LERNER, RM .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1976, 12 (06) :353-359

[7] QUENCHING CROSS-SECTIONS FOR ELECTRONIC-ENERGY TRANSFER-REACTIONS BETWEEN METASTABLE ARGON ATOMS AND NOBLE-GASES AND SMALL MOLECULES [J].

PIPER, LG ;

VELAZCO, JE ;

SETSER, DW .

JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (06) :3323-3340

[8] STIMULATED EMISSION AT 281.8 NM FROM XEBR [J].

SEARLES, SK ;

HART, GA .

APPLIED PHYSICS LETTERS, 1975, 27 (04) :243-245

[9] 100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM [J].

TISONE, GC ;

HAYS, AK ;

HOFFMAN, JM .

OPTICS COMMUNICATIONS, 1975, 15 (02) :188-189

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