HIGH-SPEED 16-KBIT N-MOS RANDOM-ACCESS MEMORY

被引:5
作者
ITOH, K
SHIMOHIGASHI, K
CHIBA, K
TANIGUCHI, K
KAWAMOTO, H
机构
[1] HITACHI LTD,CENT RES LAB,TOKYO,JAPAN
[2] HITACHI LTD,CTR DEVICE DEV,TOKYO,JAPAN
关键词
D O I
10.1109/JSSC.1976.1050785
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:585 / 590
页数:6
相关论文
共 5 条
[1]  
Ahlquist C. N., 1976, 1976 IEEE International Solid-State Circuits Conference. (Digest of technical papers), P128
[2]   PERIPHERAL CIRCUITS FOR ONE TRANSISTOR CELL MOS RAMS [J].
FOSS, RC ;
HARLAND, R .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1975, 10 (05) :255-261
[3]  
GIONIS MEJ, 1975, IEEE J SOLID STATE C, V10, P262
[4]  
Itoh K., 1976, 1976 IEEE International Solid-State Circuits Conference. (Digest of technical papers), P140
[5]   1-MIL2 SINGLE-TRANSISTOR MEMORY CELL IN N SILICON-GATE TECHNOLOGY [J].
STEIN, K ;
FRIEDRICH, H .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1973, SC 8 (05) :319-323