CONDUCTANCE STATISTICS OF SMALL-AREA OHMIC CONTACTS ON GAAS

被引:7
作者
BLANC, N
GUERET, P
BUCHMANN, P
DATWYLER, K
VETTIGER, P
机构
[1] IBM Research Division, Zurich Research Laboratory
关键词
D O I
10.1063/1.102971
中图分类号
O59 [应用物理学];
学科分类号
摘要
The conductance distributions of very small-area alloyed ohmic contacts on n+-GaAs have been studied as a function of lateral contact size d, with d ranging from 4 μm down to 0.3 μm. The data are fairly well represented by a Poisson distribution, which takes into account the granularity of the alloyed contacts, as previously reported. We deduce an average distance of dc ≃0.41 μm between conducting grains and a dead zone of ld ≃600 Å due to dry etching of the GaAs.
引用
收藏
页码:2216 / 2218
页数:3
相关论文
共 6 条
[1]   ALLOYED OHMIC CONTACTS TO GAAS [J].
BRASLAU, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :803-807
[2]   RESISTANCE OF VERY SMALL AREA OHMIC CONTACTS ON GAAS [J].
GUERET, P ;
BUCHMANN, P ;
DAETWYLER, K ;
VETTIGER, P .
APPLIED PHYSICS LETTERS, 1989, 55 (17) :1735-1737
[3]   ELECTRON-MICROSCOPE STUDIES OF AN ALLOYED AU/NI-AU-GE OHMIC CONTACT TO GAAS [J].
KUAN, TS ;
BATSON, PE ;
JACKSON, TN ;
RUPPRECHT, H ;
WILKIE, EL .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :6952-6957
[4]   DRY ETCHING INDUCED DAMAGE ON VERTICAL SIDEWALLS OF GAAS CHANNELS [J].
PANG, SW ;
GOODHUE, WD ;
LYSZCZARZ, TM ;
EHRLICH, DJ ;
GOODMAN, RB ;
JOHNSON, GD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1916-1920
[5]  
PAPOULIS A, 1965, MCGRAWHILL SERIES SY, P559
[6]   EFFECTS OF INTERFACIAL MICROSTRUCTURE ON UNIFORMITY AND THERMAL-STABILITY OF AUNIGE OHMIC CONTACT TO N-TYPE GAAS [J].
SHIH, YC ;
MURAKAMI, M ;
WILKIE, EL ;
CALLEGARI, AC .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (02) :582-590