NEW INORGANIC ELECTRON RESIST SYSTEM FOR HIGH-RESOLUTION LITHOGRAPHY

被引：31

作者：

SINGH, B

BEAUMONT, SP

BOWER, PG

WILKINSON, CDW

机构：

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 09期

关键词：

D O I：

10.1063/1.93687

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：889 / 891

页数：3

共 19 条

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TAI, KL .

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[8] PHOTOSTIMULATED SOLID-STATE REACTIONS [J].

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[9] PHOTOGRAPHIC AG PHOTODOPING OF AMORPHOUS AS2S3 FILMS [J].

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[10]

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