SILVER-HALIDE CHALCOGENIDE GLASS INORGANIC RESISTS FOR X-RAY-LITHOGRAPHY

被引：35

作者：

KOLWICZ, KD ^{[1
]}

CHANG, MS ^{[1
]}

机构：

[1] UNIV PENN,MOORE SCH ELECT ENGN,PHILADELPHIA,PA 19104

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期

关键词：

D O I：

10.1149/1.2129603

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：135 / 138

页数：4

共 28 条

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[9]

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[10] ELECTRON-BEAM AND X-RAY RESIST BEHAVIOR OF POLY(METHACRYLONITRILE) [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (04) :694-696

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